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剝蝕系統(tǒng)專用激光氣

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凌美貿(mào)易(上海)有限公司是美國 NOVA GAS Technologies的亞太地區(qū)總代理,覆蓋中國,日本、韓國、新加坡、越南及緬甸等。主營混合氣、準(zhǔn)分子激光氣。產(chǎn)品主要應(yīng)用于激光器設(shè)備、測試服務(wù)、醫(yī)療、半導(dǎo)體和光學(xué)等行業(yè)。


Nova Gas Technologies is a major international supplier of gas mixtures for excimer lasers.Semiconductor manufacturing uses these excimer lasers in the lithography process. Similar lasers are used in vision correction surgery. Industrial applications include diamond marking and micro machining.Our commitment to excellence is unsurpassed and our state of the art production facility allows us to provide customers with the highest quality excimer laser gas mixtures. Whether you require a gas mixture for semiconductor, medical or industrial laser applications you will find that Nova Gas can meet your needs.

Nova Gas Technologies, Inc. was founded in 1964 as Cryogenic Rare Gas Laboratories, Inc. to import, purify and resell the rare gases: Krypton, Neon, and Xenon. Nova Gas began to offer gas mixtures for excimer lasers in 1978. Our commitment to research and quality products continues into our 54th Year. Nova Gas Technologies is ISO 9001: 2015 Certified.


1.Excimer gas mixtures consist of combinations of rare gases and halogen gases. Different mixtures will produce different wave lengths in the laser.

  Fluorine + Argon – 193 nm、Fluorine + Krypton – 248 nm、Fluorine + Xenon – 351 nm、Hydrogen Chloride + Xenon – 308 nm、Hydrogen Chloride + Krypton – 222 nm

2.Nova Gas is a leading supplier of rare gases for use in research and other applications.

  ArgonHeliumNeonKrypton Xenon


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混合氣、準(zhǔn)分子激光氣

應(yīng)用領(lǐng)域 醫(yī)療衛(wèi)生,化工,生物產(chǎn)業(yè),地礦,電子

凌美貿(mào)易(上海)有限公司是美國 NOVA GAS Technologies的亞太地區(qū)總代理,覆蓋中國,日本、韓國、新加坡、越南及緬甸等。主營混合氣、準(zhǔn)分子激光氣。產(chǎn)品主要應(yīng)用于激光器設(shè)備、測試服務(wù)、醫(yī)療、半導(dǎo)體和光學(xué)等行業(yè)。


優(yōu)勢: 1.保質(zhì)期5年,充分滿足實驗室的使用周期

2.已給眾多高校、科研、檢測、半導(dǎo)體公司供貨,激光能量穩(wěn)定

3.價格已與國產(chǎn)氣體貼近,預(yù)算可控

4.已獲得多家設(shè)備商認證(Coherent、Teledyne Photon Machines、Cymer、Gigaphoto等)


主營以下產(chǎn)品,獲取更多詳情,請聯(lián)系業(yè)務(wù)人員

%F2+%Ar/Ne             %F2+%Kr/Ne

ppmXe+%Ar/Ne         %Kr/Ne

%HCL+H+Ne             ArF   KrF   XeCl






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